Title: New Results on Electromigration Modeling - A departure from Blech's Theory
Date: September 25, 2019
Time: 11:00 AM EDT
Presenter: Xuejun Fan
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We have recently developed a multi-physics-based general coupling theory for electromigration (J. Appl. Phys. 125, 105101, 2019). The results show the mechanical stress is significantly less than the existing literature solutions. In addition, the vacancy concentration gradient plays an important role in formulating electromigration problems. We revisited Blech’s theory and a new threshold criterion for electromigration failure has been developed. This is a major departure from the Blech’s theory, and the preliminary results show the predicted results are consistent with the Blech’s original test data.